Work

In situ detection of rearrangement processes during electron beam annealing of ion implanted InP

Year: 1993

Type: article

Source: Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

DOI: 10.1016/0168-583x(93)96182-c

Authors: C. Maurer, R. Kallweit, H. Baumann, K. Bethge, E.F. Krimmel

Institutions: Goethe University Frankfurt, Deutsche Bundespost

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2004223352

FWCI: 3.827

Cites: 4

Cited by: 29

Related to: 10