Work

Plasma Impacts to an O-SiC Low-k Barrier Film

Year: 2004

Type: article

Source: Journal of The Electrochemical Society

DOI: 10.1149/1.1768949

Authors: Wei Chen, Qingyuan Han, Robert Most, Carlo Waldfried, Orlando Escorcia, Ivan Berry

Institution: Axcelis Technologies (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2002554652

FWCI: 1.899

Cites: 8

Cited by: 17

Related to: 10