Work

Effect of Carrier Gas (Ar and He) on the Crystallographic Quality of Networked Nanographite Grown on Si Substrates by Photoemission-Assisted Plasma-Enhanced Chemical Vapor Deposition

Year: 2010

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.49.076201

Authors: Haruki Sumi, Shuichi Ogawa, Motonobu Sato, Akihiko Saikubo, Eiji Ikenaga, Mizuhisa Nihei, Yuji Takakuwa

Institutions: Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Japan Science and Technology Agency, Fujitsu (Japan), Japan Synchrotron Radiation Research Institute

Language: English

Topic: Graphene research and applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2003376573

FWCI: 1.539

Cites: 26

Cited by: 23

Related to: 10