Author

Mizuhisa Nihei

Observed names: Mizuhisa NIHEI, Mizuhisa Nihei Mizuhisa Nihei, Nihei Mizuhisa

Observed institutions: Tohoku University, Huawei Technologies (China), Fujitsu (Japan), Japan Science and Technology Agency, Centre for Research in Engineering Surface Technology, Japan Synchrotron Radiation Research Institute, Centre de Recherche en Économie et Statistique, Semiconductor Leading Edge Technologies, Inc (Japan), Research Institute of Electrical Communication, Tohoku University, National Institute of Advanced Industrial Science and Technology

OpenAlex ID: A5113602716

Electrical Properties of Carbon Nanotube Bundles for Future Via Interconnects

2005 · Mizuhisa Nihei, Akio Kawabata, et al. · Japanese Journal of Applied Physics · 173

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Simultaneous Formation of Multiwall Carbon Nanotubes and their End-Bonded Ohmic Contacts to Ti Electrodes for Future ULSI Interconnects

2004 · Mizuhisa Nihei, Masahiro Horibe, et al. · Japanese Journal of Applied Physics · 129

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Carbon Nanotubes for VLSI: Interconnect and Transistor Applications

2010 · Yuji Awano, Shintaro Sato, et al. · Proceedings of the IEEE · 108

Low-Temperature Synthesis of Graphene and Fabrication of Top-Gated Field Effect Transistors without Using Transfer Processes

2010 · Daiyu Kondo, Shintaro Sato, et al. · Applied Physics Express · 107

Low temperature grown carbon nanotube interconnects using inner shells by chemical mechanical polishing

2007 · Daisuke Yokoyama, Takayuki Iwasaki, et al. · Applied Physics Letters · 105

Growth of diameter-controlled carbon nanotubes using monodisperse nickel nanoparticles obtained with a differential mobility analyzer

2003 · Shintaro Sato, Akio Kawabata, et al. · Chemical Physics Letters · 82

Low-resistance multi-walled carbon nanotube vias with parallel channel conduction of inner shells

2005 · Mizuhisa Nihei, Daiyu Kondo, et al. · 74

Carbon Nanotube Growth Technologies Using Tantalum Barrier Layer for Future ULSIs with Cu/Low-k Interconnect Processes

2005 · Masahiro Horibe, Mizuhisa Nihei, et al. · Japanese Journal of Applied Physics · 69

Electrical Properties of Carbon Nanotubes Grown at a Low Temperature for Use as Interconnects

2008 · Daisuke Yokoyama, Takayuki Iwasaki, et al. · Japanese Journal of Applied Physics · 68

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Direct Diameter-Controlled Growth of Multiwall Carbon Nanotubes on Nickel-Silicide Layer

2003 · Mizuhisa Nihei, Akio Kawabata, et al. · Japanese Journal of Applied Physics · 68

Synthesis of a Closely Packed Carbon Nanotube Forest by a Multi-Step Growth Method Using Plasma-Based Chemical Vapor Deposition

2010 · Yuichi Yamazaki, Masayuki Katagiri, et al. · Applied Physics Express · 63

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Carbon nanotube growth from titanium–cobalt bimetallic particles as a catalyst

2004 · Shintaro Sato, Akio Kawabata, et al. · Chemical Physics Letters · 59

Thermal oxidation of outdiffusing SiO with permeating O2 in a SiO2 film studied by angle-resolved X-ray photoelectron spectroscopy

1997 · Yuji Takakuwa, Mizuhisa Nihei, et al. · Applied Surface Science · 56

Catalyst-Free Growth of Networked Nanographite on Si and SiO2 Substrates by Photoemission-Assisted Plasma-Enhanced Chemical Vapor Deposition

2009 · Tomohide Takami, Shuichi Ogawa, et al. · e-Journal of Surface Science and Nanotechnology · 41

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Thermal oxidation mechanism based on formation and diffusion of volatile SiO molecules

1994 · Yuji Takakuwa, Mizuhisa Nihei, et al. · Journal of Non-Crystalline Solids · 35

Selective synthesis of carbon nanotubes and multi-layer graphene by controlling catalyst thickness

2011 · Daiyu Kondo, Katsunori Yagi, et al. · Chemical Physics Letters · 33

Intercalated multilayer graphene wires and metal/multilayer graphene hybrid wires obtained by annealing sputtered amorphous carbon

2014 · Motonobu Sato, Makoto Takahashi, et al. · Japanese Journal of Applied Physics · 31

Electrical Properties of Carbon Nanotube Via Interconnects Fabricated by Novel Damascene Process

2007 · Mizuhisa Nihei, Takashi Hyakushima, et al. · IEEE International Interconnect Technology Conference (IITC) · 31

Robustness of CNT Via Interconnect Fabricated by Low Temperature Process over a High-Density Current

2008 · Akio Kawabata, Shintaro Sato, et al. · IEEE International Interconnect Technology Conference (IITC) · 29

Outdiffusion and Subsequent Desorption of Volatile SiO Molecules during Annealing of Thick SiO2 Films in Vacuum

1993 · Yuji Takakuwa, Mizuhisa Nihei Mizuhisa Nihei, et al. · Japanese Journal of Applied Physics · 27

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Denser and taller carbon nanotube arrays on Cu foils useable as thermal interface materials

2015 · Nuri Na, Kei Hasegawa, et al. · Japanese Journal of Applied Physics · 26

Carbon Nanotube Vias Fabricated by Remote Plasma-Enhanced Chemical Vapor Deposition

2008 · Masayuki Katagiri, Naoshi Sakuma, et al. · Japanese Journal of Applied Physics · 24

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Effect of Carrier Gas (Ar and He) on the Crystallographic Quality of Networked Nanographite Grown on Si Substrates by Photoemission-Assisted Plasma-Enhanced Chemical Vapor Deposition

2010 · Haruki Sumi, Shuichi Ogawa, et al. · Japanese Journal of Applied Physics · 23

Mechanical Polishing Technique for Carbon Nanotube Interconnects in ULSIs

2004 · Masahiro Horibe, Mizuhisa Nihei, et al. · Japanese Journal of Applied Physics · 21

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High-Quality Carbon Nanotube Growth at Low Temperature by Pulse-Excited Remote Plasma Chemical Vapor Deposition

2008 · Yuichi Yamazaki, Naoshi Sakuma, et al. · Applied Physics Express · 20

Works count: 85

Citation count: 1,801

H-index: 23

I10-index: 41