Work

Thermal oxidation mechanism based on formation and diffusion of volatile SiO molecules

Year: 1994

Type: article

Source: Journal of Non-Crystalline Solids

DOI: 10.1016/0022-3093(94)90715-3

Authors: Yuji Takakuwa, Mizuhisa Nihei, Tetsuhiro Horie, Nobuo Miyamoto

Institutions: Tohoku University, Research Institute of Electrical Communication, Tohoku University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2022959249

FWCI:

Cites: 25

Cited by: 35

Related to: 10