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Tetsuhiro Horie
Observed names:
T. Horie,
Tetsuhiro HORIE,
Tetsuhiro Horie Tetsuhiro Horie
Institution:
Research Institute of Electrical Communication, Tohoku University
Observed institutions:
Tohoku University,
Mitsubishi Heavy Industries (Japan),
Research Institute of Electrical Communication, Tohoku University
OpenAlex ID:
A5044747751
Two-Dimensional Growth and Decomposition of Initial Thermal SiO2 Layer on Si(100)
1994
·
Tetsuhiro Horie
, Yuji Takakuwa
, et al.
·
Japanese Journal of Applied Physics
·
43
Thermal oxidation mechanism based on formation and diffusion of volatile SiO molecules
1994
·
Yuji Takakuwa
, Mizuhisa Nihei
, et al.
·
Journal of Non-Crystalline Solids
·
35
Origin of surface-state photoemission intensity oscillation during Si epitaxial growth on a Si(100) surface
1994
·
Y. Enta
, T. Horie
, et al.
·
Surface Science
·
10
Kinetics of dissociative adsorption of dichlorosilane on Si(100)2 × 1
1996
·
Hitoshi Sakamoto
, Yuji Takakuwa
, et al.
·
Applied Surface Science
·
8
First-order isothermal desorption kinetics of chlorine on SiH2Cl2-adsorbed Si(100) surface
1994
·
Hitoshi Sakamoto
, Yuji Takakuwa
, et al.
·
Applied Surface Science
·
8
Hydrogen desorption rate and surface hydrogen coverage during isothermal annealing for Si2H6-adsorbed Si(100) surfaces
1994
·
Tetsuhiro Horie
, Yuji Takakuwa
, et al.
·
Journal of Crystal Growth
·
7
Low-Temperature Growth of SiO2 Films by Electron-Induced Ultrahigh Vacuum Chemical Vapor Deposition
1996
·
Koji Nakano
, Tetsuhiro Horie Tetsuhiro Horie
, et al.
·
Japanese Journal of Applied Physics
·
6
PDF
In situ observation of thermal and photon-induced reactions on Si surfaces by ultraviolet photoelectron spectroscopy
1998
·
Y. Takakuwa
, T. Yamaguchi
, et al.
·
Journal of Electron Spectroscopy and Related Phenomena
·
5
In situ monitoring of gas source molecular beam epitaxy of silicon with disilane by ultraviolet photoelectron spectroscopy
1997
·
H. Sakamoto
, Y. Takakuwa
, et al.
·
Applied Surface Science
·
5
Two-Dimensional Growth and Decomposition of Initial Thermal SiO2 Layer on Si(100)
1993
·
Tetsuhiro HORIE
, Yuji TAKAKUWA
, et al.
·
International Conference on Solid State Devices and Materials (SSDM)
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Works count:
10
Citation count:
127
H-index:
6
I10-index:
3
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