Work

Characterization of thermal oxides grown on TaSi2/polysilicon films

Year: 1985

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

DOI: 10.1116/1.583305

Authors: D. Pawlik, H. Oppolzer, T. Hillmer

Institution: Siemens (Germany)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2003588134

FWCI: 3.255

Cites:

Cited by: 12

Related to: 10