Lithographic effects of mask critical dimension error
Year: 1998
Type: conference-paper
DOI: 10.1117/12.310718
Authors: Alfred K. K. Wong, Richard A. Ferguson, Lars W. Liebmann, Scott M. Mansfield, Antoinette F. Molless, Mark O. Neisser
Institution: IBM (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2004188318