Work

Trends in advanced process technology—Submicrometer CMOS device design and process requirements

Year: 1986

Type: article

Source: Proceedings of the IEEE

DOI: 10.1109/proc.1986.13685

Authors: D.M. Brown, M. Ghezzo, J.M. Pimbley

Institution: General Electric (United States)

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2004357738

FWCI: 7.323

Cites: 69

Cited by: 30

Related to: 10