Work

Plasma-etching processes for ULSI semiconductor circuits

Year: 1999

Type: article

Source: IBM Journal of Research and Development

DOI: 10.1147/rd.431.0039

Authors: M. Armacost, P. D. Hoh, R. Wise, W. Yan, J.J. Brown, J. H. Keller, G. A. Kaplita, S. D. Halle, K. P. Muller, M. D. Naeem, S. Srinivasan, H. Y. Ng, M. Gutsche, A. Gutmann, B. Spuler

Institution: IBM (United States)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2005380170

FWCI: 2.993

Cites: 8

Cited by: 58

Related to: 10