Work

X-ray Photoelectron Spectroscopy Study of Interfacial Reactions between Metal and Ultrathin Ge Oxide

Year: 2011

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.7567/jjap.50.10pe01

Authors: Akio Ohta, Tomohiro Fujioka, Hideki Murakami, Seiichiro Higashi, Seiichi Miyazaki

Institutions: Hiroshima University, Nagoya University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Office of Naval Research

OpenAlex ID: W2006259406

FWCI: 1.3

Cites: 23

Cited by: 22

Related to: 10