Work

High‐pass energy‐filtered photoemission electron microscopy imaging of dopants in silicon

Year: 2008

Type: article

Source: Journal of Microscopy

DOI: 10.1111/j.1365-2818.2008.01953.x

Authors: M. HOVORKA, L. FRANK, D. VALDAITSEV, S.A. NEPIJKO, H.S. ELMERS, G. SCHÖNHENSE

Institutions: Czech Academy of Sciences, Institute of Scientific Instruments, Johannes Gutenberg University Mainz

Language: English

Topic: Electron and X-Ray Spectroscopy Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2007281905

FWCI: 0.652

Cites: 19

Cited by: 5

Related to: 10