Work

Niobium silicide formation induced by Ar-ion bombardment

Year: 1979

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.91102

Authors: T. Kanayama, H. Tanoue, T. Tsurushima

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2007351649

FWCI: 3.893

Cites: 7

Cited by: 36

Related to: 10