Work

Surface modification and cleaning enhancement of TaSi(N) films with dilute hydrofluoric acid

Year: 2000

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.582327

Authors: P. J. S. Mangat, W. J. Dauksher, R. Whig, W. L. O’Brien

Institution: Motorola (United States)

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Foundation

OpenAlex ID: W2007493726

FWCI: 0.259

Cites: 12

Cited by: 8

Related to: 10