Anomalous depth distributions of bulk microdefects in heat-treated Czochralski silicon wafers due to nonequilibrium self-interstitials
Year: 1995
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.358610
Institution: Mitsubishi Materials (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2008000862
