Work

Sources of overlay error in double patterning integration schemes

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.773575

Authors: David Laidler, Philippe Leray, Koen D’havé, Shaunee Cheng

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2008015292

FWCI: 9.004

Cites: 4

Cited by: 30

Related to: 10