Work

Perfect Crystal Growth of Silicon by Vapor Deposition

Year: 1975

Type: article

Source: Journal of The Electrochemical Society

DOI: 10.1149/1.2134288

Authors: Jun‐ichi Nishizawa, Takeshi Terasaki, Kunihiko Yagi, Nobuo Miyamoto

Institutions: Tohoku University, Research Institute of Electrical Communication, Tohoku University

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2008556754

FWCI: 2.272

Cites:

Cited by: 25

Related to: 10