Work

High-sensitivity EUV resists based on fluorinated polymers

Year: 2011

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.879568

Authors: Tsuneo Yamashita, Masamichi Morita, Yoshito Tanaka, Julius Joseph Santillan, Toshiro Itani

Institutions: Daikin (Japan), Semiconductor Leading Edge Technologies, Inc (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2010165187

FWCI: 0.847

Cites:

Cited by: 5

Related to: 10