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Tsuneo Yamashita

19F NMR of 2-deoxy-2-fluoro-D-glucose for tumor diagnosis in mice. An NDP-bound hexose analog as a new NMR target for imaging
1997 · Yoko Kanazawa, Keiko Umayahara, et al. · NMR in Biomedicine · 29
Novel main-chain-fluorinated polymers for 157-nm photoresists
2003 · Minoru Toriumi, Meiten Koh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Dry-etch resistance of fluorine functionalized polymers
2002 · Meiten Koh, Takuji Ishikawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
One-methylene incorporated dimerization reaction of ketone enolates. 1. A new route to 1,5-diketones from ketones having α-active hydrogen on one side
1986 · Syun-ichi Kiyooka, Tsuneo Yamashita, et al. · Tetrahedron Letters · 11
Surface Chemistry of Fluorine Lyophobic Resist
2011 · Masamichi Morita, Yoshihiko Kinoshita, et al. · Journal of Photopolymer Science and Technology · 9
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Synthesis of novel fluorinated norbornene derivatives for 157-nm application
2003 · Meiten Koh, Takuji Ishikawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography
2004 · Takuya Hagiwara, Takamitsu Furukawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Novel fluorinated polymers for application in 193-nm lithography and 193-nm immersion lithography
2006 · Tsuneo Yamashita, Takuji Ishikawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials
2004 · Takuji Ishikawa, Tetsuhiro Kodani, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Evaluation of Template Release Energy with Use of Fluorinated Segregation Agents for UV Nanoimprint Resists
2014 · Naoto Nakamura, Tsuneo Yamashita, et al. · Journal of Photopolymer Science and Technology · 5
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Novel Fluorinated Polymers for Releasing Material in Nanoimprint Lithography
2012 · Tsuneo Yamashita, Ikuo Yamamoto, et al. · Journal of Photopolymer Science and Technology · 5
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High-sensitivity EUV resists based on fluorinated polymers
2011 · Tsuneo Yamashita, Masamichi Morita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
High-sensitivity EUV Resists based on Tetrafluoroethylene contained Fluoropolymers
2011 · Tsuneo Yamashita, Masamichi Morita, et al. · Journal of Photopolymer Science and Technology · 5
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Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers
2003 · Tamio Yamazaki, Takamitsu Furukawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Stereospecific Preparation of Chiral 1,5-Diketone by One-Methylene Incorporated Dimerization Reaction of d-Camphor Enolate and Reduction of the 1,5-Diketone
1989 · Syun-ichi Kiyooka, Tsuneo Yamashita, et al. · Bulletin of the Chemical Society of Japan · 5
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Lyophobic and Development Properties of Fluorine Lyophobic Resist
2009 · Masamichi MORITA, Takuji ISHIKAWA, et al. · KOBUNSHI RONBUNSHU · 4
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Enaminone Intermediate in the One-Methylene Incorporated Dimerization Reaction of Ketone Enolate. Cross Reaction to Unsymmetrical 1,5-Diketones
1987 · Syun-ichi Kiyooka, Tsuneo Yamashita · Chemistry Letters · 4
Fluorinated-Polymer Based High Sensitivity Extreme Ultraviolet Resists
2010 · Julius Joseph Santillan, Tsuneo Yamashita, et al. · Japanese Journal of Applied Physics · 3
Synthesis of novel α-fluoroacrylates and related polymers for immersion lithography
2008 · Tsuneo Yamashita, Takuji Ishikawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials
2004 · Takuji Ishikawa, Tesuhiro Kodani, et al. · Journal of Fluorine Chemistry · 2
Novel fluorinated compounds that improve durability of antistick layer for quartz mold
2014 · Tsuneo Yamashita, Hisashi Mitsuhashi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Novel fluorinated compounds for releasing material in nanoimprint lithography
2013 · Tsuneo Yamashita, Hisashi Mitsuhashi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Novel Fluorinated Compounds for Releasing Material in Nanoimprint Lithography
2013 · Tsuneo Yamashita, Masamichi Morita · Journal of Photopolymer Science and Technology · 1
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Novel low-reflective index fluoropolymers-based top anti-reflective coatings (TARC) for 193-nm lithography
2007 · Tsuneo Yamashita, Takashi Hayami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Novel Fluorinated Compounds that Improve Durability of Antistick Layer for Quartz Mold
2014 · Tsuneo Yamashita, Syuso Iyoshi, et al. · Journal of Photopolymer Science and Technology
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Works count: 29
Citation count: 151
H-index: 7
I10-index: 4
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