Work

Novel main-chain-fluorinated polymers for 157-nm photoresists

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.485085

Authors: Minoru Toriumi, Meiten Koh, Takuji Ishikawa, T. Kodani, Takayuki Araki, Hirokazu Aoyama, Tsuneo Yamashita, Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani

Institutions: Daikin (Japan), Semiconductor Leading Edge Technologies, Inc (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2053879754

FWCI: 4.037

Cites:

Cited by: 13

Related to: 10