Work

Characterization and performance of advanced i-line photoresists for 0.5-micron CMOS technology

Year: 1992

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.130315

Authors: Jeffrey R. Johnson, Gregory J. Stagaman, John C. Sardella, Charles R. Spinner III, Fu-Tai Liou

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2010167504

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