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Fu‐Tai Liou

Mechanism of Threshold Voltage Shift (ΔVth) Caused by Negative Bias Temperature Instability (NBTI) in Deep Submicron pMOSFETs
2002 · Chuan-Hsi Liu, Ming T. Lee, et al. · Japanese Journal of Applied Physics · 45
Evidence of hole flow in silicon nitride for positive gate voltage
1984 · Fu-Tai Liou, Shih-Ou Chen · IEEE Transactions on Electron Devices · 39
Photoelectrolysis at Fe2 O 3 / TiO2 Heterojunction Electrode
1982 · Fu‐Tai Liou, Chiang Y. Yang, et al. · Journal of The Electrochemical Society · 33
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IIIB-7 evidence of hole flow in silicon nitride for positive gate voltage
1984 · Fu-Tai Liou, Shih-ou Chen · IEEE Transactions on Electron Devices · 15
Sub-half-micron i-line photolithography process using AZ BARLi
1995 · Jeffrey R. Johnson, Todd H. Gandy, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Extending the reliability scaling limit of gate dielectrics through remote plasma nitridation of N/sub 2/O-grown oxides and NO RTA treatment
2003 · C.H. Liu, Hsiu-Shan Lin, et al. · IEEE International Reliability Physics Symposium proceedings · 3
Stability of Semiconducting TiO2 Photoanodes
1983 · Fu‐Tai Liou, Chiang Y. Yang, et al. · Journal of The Electrochemical Society · 3
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Thin Dielectric Quality/Yield Study Using a Constant Voltage Ramp Method
1989 · Frank Bryant, Fu‐Tai Liou, et al. · Journal of The Electrochemical Society · 2
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Improved aluminum plug process for submicron via filling
1994 · Hong Yang, Yih-Shung Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Effects of absorptive dye loading and substrate reflectivity on a 0.5-micron i-line photoresists process
1993 · Jeffrey R. Johnson, Gregory J. Stagaman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Manufacturing challenges for sub-half-micron technologies
1995 · Fu-Tai Liou · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Manufacturing challenges for sub-half-micron technologies
1995 · Fu-Tai Liou · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Manufacturing challenges for sub-half micron technologies
1995 · Fu-Tai Liou · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Manufacturing challenges for sub-half micron technologies
1995 · Fu-Tai Liou · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Plasma charging effects on device degradation from via sputter etch
1995 · Lakshmanna Vishnubhotla, Jamin M. Ling, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Characterization and performance of advanced i-line photoresists for 0.5-micron CMOS technology
1992 · Jeffrey R. Johnson, Gregory J. Stagaman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Time Dependent Dielectric Breakdown of Silicon Dioxide under Constant Tunneling Current Stress
1989 · Fu‐Tai Liou, D. Tiffin, et al. · Final Report
Second Breakdown Susceptibility of Silicon-On-Sapphire Diodes having Systematically Different Geometries.
1980 · Paul P. Budenstein, Aradhana Baruah, et al.
Works count: 18
Citation count: 147
H-index: 5
I10-index: 4
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