Work

Impact of acid/quencher behavior on lithography performance

Year: 2001

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.435732

Authors: Hiroshi Fukuda, Keiko T. Hattori, Takuya Hagiwara

Institution: Hitachi (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2010264394

FWCI: 2.595

Cites:

Cited by: 28

Related to: 10