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Takuya Hagiwara

Impact of acid/quencher behavior on lithography performance
2001 · Hiroshi Fukuda, Keiko T. Hattori, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 28
Characterization of Fluoropolymer Resist for 157-nm Lithography
2003 · Takuya Hagiwara, Shigeo Irie, et al. · Journal of Photopolymer Science and Technology · 8
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Study on Cone-defects during the Pattern Fabrication Process with Silicon Nitride
2015 · Takuya Hagiwara, Kentaro Saito, et al. · Journal of Photopolymer Science and Technology · 7
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Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography
2004 · Takuya Hagiwara, Takamitsu Furukawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Surface Segregation Analysis of Hydrophobic Additive of Non-topcoat Resist
2008 · Takuya Hagiwara, Takeo Ishibashi, et al. · Journal of Photopolymer Science and Technology · 6
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The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials
2004 · Takuji Ishikawa, Tetsuhiro Kodani, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Dry-etching resistance of fluoropolymers for 157-nm single-layer resists
2003 · Yasuhide Kawaguchi, Jun Irisawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Analysis of Quencher Diffusion in Chemically Amplified Resists and Its Effect on Imaging Characteristics.
2000 · Keiko Hattori, Shoji Hotta, et al. · Journal of Photopolymer Science and Technology · 5
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Immersion-Specific Defects of High-Receding-Angle Topcoat
2010 · Mamoru Terai, Teruhiko Kumada, et al. · Japanese Journal of Applied Physics · 4
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Novel Wafer Bevel Treatment for Water Immersion Lithography
2008 · Mamoru Terai, Takeo Ishibashi, et al. · Journal of Photopolymer Science and Technology · 3
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Evaluation of outgassing from a fluorinated resist for 157nm lithography
2004 · Shigeo Irie, Takuya Hagiwara, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 3
157-nm Single-Layer Resists Based on Main-Chain-Fluorinated Polymers
2003 · Shigeo Irie, Seiichi Ishikawa, et al. · Japanese Journal of Applied Physics · 3
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Double patterning using dual spin-on Si containing layers with multilayer hard mask process
2008 · Mamoru Terai, Takeo Ishibashi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Mechanism of immersion specific defects with high receding-angle topcoat
2007 · Mamoru Terai, Teruhiko Kumada, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Liquid immersion lithography at 157 nm
2005 · Takuya Hagiwara, Toshiyuki Ishimaru, et al. · Optical Microlithography XVIII · 2
Dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials
2004 · Takuji Ishikawa, Tesuhiro Kodani, et al. · Journal of Fluorine Chemistry · 2
Double Patterning Using Multilayer Hard Mask Process with Perhydropolysilazane
2011 · Mamoru Terai, Masaaki Shinohara, et al. · Japanese Journal of Applied Physics · 1
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Defect reduction in non-topcoat resist by selective segregation removal step
2009 · Takuya Hagiwara, Mamoru Terai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Sub-40nm pattern fabrication in 157nm interferometric immersion lithography
2006 · Takuya Hagiwara, Shou Tsuji, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Advances in resist pattern transfer process using 157-nm lithography
2004 · Takamitsu Furukawa, Takuya Hagiwara, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
High transparency resists for 157 nm lithography
2003 · Toshiro Itani, Seiichi Ishikawa, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1
Patterning of random interconnect using double exposure of strong-type PSMs
2001 · Hiroshi Fukuda, Takuya Hagiwara · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Reliability and Scalability of FinFET Split-Gate MONOS Array with Tight Vth Distribution for 16/14nm-node Embedded Flash
2018 · Shibun Tsuda, Tomoya Saito, et al. · IEICE Technical Report; IEICE Tech. Rep.
Application of super-diffraction-lithography (SDL) for advanced logic
2008 · Shuji Nakao, Shinroku Maejima, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Improvements of adhesion and hydrophobicity of wafer bevel in water immersion lithography
2008 · Takeo Ishibash, Mamoru Terai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 33
Citation count: 100
H-index: 6
I10-index: 1
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