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Advances in resist pattern transfer process using 157-nm lithography

Year: 2004

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.535177

Authors: Takamitsu Furukawa, Takuya Hagiwara, Etsurou Kawaguchi, Kentaro Matsunaga, Toshifumi Suganaga, Toshiro Itani, Kiyoshi Fujii

Institution: Semiconductor Leading Edge Technologies, Inc (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2030196896

FWCI:

Cites:

Cited by: 1

Related to: 10