Work

The impact of the nitridation process on the properties of the Si–SiO2 interface

Year: 2001

Type: article

Source: Journal of Non-Crystalline Solids

DOI: 10.1016/s0022-3093(00)00352-5

Authors: M.L. Polignano, M. Alessandri, B. Crivelli, R. Zonca, A.P. Caricato, M. Bersani, M. Sbetti, L. Vanzetti

Institution: STMicroelectronics (Italy)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2010515804

FWCI: 0.801

Cites: 10

Cited by: 4

Related to: 10