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M. Sbetti
Observed names:
M Sbetti,
M. SBETTI,
Maurizio Sbetti,
Sbetti, Maurizio
Observed institutions:
University of Trento,
TeraDiode (United States),
Istituto Nazionale per la Fisica della Materia,
Istituto per la Ricerca Scientifica e Tecnologica,
Politecnico di Milano
OpenAlex ID:
A5039616036
Boron-interstitial silicon clusters and their effects on transient enhanced diffusion of boron in silicon
2000
·
S. Solmi
, M. Bersani
, et al.
·
Journal of Applied Physics
·
21
Homogeneous line width in a zinc borate glass activated by Eu3+
1997
·
M. Sbetti
, E. Moser
, et al.
·
Journal of Non-Crystalline Solids
·
19
Characterization of rapid thermal processing oxynitrides by SIMS and XPS analyses
1999
·
M Bersani
, L Vanzetti
, et al.
·
Applied Surface Science
·
10
XPS and SIMS depth profiling of oxynitrides
2000
·
L. Vanzetti
, M. Bersani
, et al.
·
Surface and Interface Analysis
·
9
ULSI technology and materials: Quantitative answers by combined mass spectrometry surface techniques
1998
·
M. Bersani
, M. Fedrizzi
, et al.
·
International Conference on Characterization and Metrology for ULSI Technology
·
8
Quantitative identification of laser cutting quality relying on visual information
2017
·
Matteo Pacher
, Lorenzo Monguzzi
, et al.
·
Virtual Community of Pathological Anatomy (University of Castilla La Mancha)
·
6
PDF
Laser cutting of copper and brass alloys by high brilliance diode source with an extremely low BPP
2015
·
Barbara Previtali
, Giovanni Riva
, et al.
·
International Congress on Applications of Lasers & Electro-Optics (ICALEO)
·
4
The impact of the nitridation process on the properties of the Si–SiO2 interface
2001
·
M.L. Polignano
, M. Alessandri
, et al.
·
Journal of Non-Crystalline Solids
·
4
Characterization of nitrided silicon-silicon dioxide interfaces
1999
·
M. L. Polignano
, M. Alessandri
, et al.
·
MRS Proceedings
·
3
Sample holder implement for very small samples on SC-ultra SIMS instrument
2004
·
M. Barozzi
, D. Giubertoni
, et al.
·
Applied Surface Science
·
1
XPS and SIMS depth profiling of chlorine in high‐temperature oxynitrides
2002
·
L. Vanzetti
, M. Bersani
, et al.
·
Surface and Interface Analysis
·
1
Procedimento per una lavorazione laser
2019
·
Matteo Pacher
, Mara Tanelli
, et al.
·
Virtual Community of Pathological Anatomy (University of Castilla La Mancha)
Chatacterization of nitrided silicon-silicon dioxide interfaces
2000
·
M. L. POLIGNANO
, M. ALESSANDRI
, et al.
·
AIRUS
Ultrathin NO/N2O Oxynitride Dielectric For Advanced Flash Memory Application: Single Wafer and Batch Technology
1999
·
R. Zonca
, B. Crivelli
, et al.
·
MRS Proceedings
Ultra-thin NO/N2O oxynitride dielectric for advanced flash memory applications: single wafer and batch technology
1999
·
B. CRIVELLI
, R. ZONCA
, et al.
·
AIRUS
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Works count:
16
Citation count:
86
H-index:
6
I10-index:
3
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