Work

Ultra-thin NO/N2O oxynitride dielectric for advanced flash memory applications: single wafer and batch technology

Year: 1999

Type: conference-paper

Source: AIRUS

Authors: B. CRIVELLI, R. ZONCA, M. L. POLIGNANO, F. CAZZANIGA, M. ALESSANDRI, M. BERSANI, M. SBETTI, L. VANZETTI, G. C. XING, G. E. MINER, N. ATICI, S. KUPPURAO AND D. LOPES, CARICATO, Anna Paola

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7217428503

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