Work

Characterization of nitrided silicon-silicon dioxide interfaces

Year: 1999

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-591-207

Authors: M. L. Polignano, M. Alessandri, D. Brazzelli, B. Crivelli, G. Ghidini, R. Zonca, A. P. Caricato, M. Bersani, M. Sbetti, L. Vanzetti, G. C. Xing, G.E. Miner, N. Astici, S. Kuppurao, D. Lopes

Institutions: Istituto per la Ricerca Scientifica e Tecnologica, Applied Materials (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2142911348

FWCI: 0.855

Cites: 7

Cited by: 3

Related to: 10