Work

Selective-area ion implantation using positive photoresist mask for GaAs digital integrated circuits

Year: 1993

Type: article

Source: Semiconductor Science and Technology

DOI: 10.1088/0268-1242/8/12/019

Authors: A A Naik, B K Sehgal, S Mohan, S Dayal, R Gulati, I Chandra

Institution: Solid State Physics Laboratory

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2010535193

FWCI:

Cites: 9

Cited by: 2

Related to: 10