Work

Submicrometer FET gate fabrication using resistless and focused ion beam techniques

Year: 1985

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

DOI: 10.1116/1.583247

Authors: David B. Rensch, John Y. Chen, William M. Clark, M. DuChesne Courtney

Institution: HRL Laboratories (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2011820941

FWCI: 0.543

Cites:

Cited by: 3

Related to: 10