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Tailorable BARC system to provide optimum solutions for various substrates in immersion lithography

Year: 2011

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.879462

Authors: Michael Swope, Vandana Krishnamurthy, Zhimin Zhu, Daniel Sullivan, Sean Simmons, Chris Cox, Randy Bennett, Cheryl Nesbit

Institution: Brewer Science (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2012136227

FWCI:

Cites: 6

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Related to: 10