Work

APF pitch-halving for 22nm logic cells using gridded design rules

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.772905

Authors: Michael C. Smayling, Christopher Bencher, Hao D. Chen, Huixiong Dai, Michael P. Duane

Institutions: Tela Innovations (United States), Applied Materials (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2012552926

FWCI: 3.791

Cites: 4

Cited by: 30

Related to: 10