Noble development system to achieve defect-free process for 65-nm node photomasks
Year: 2005
Type: conference-paper
DOI: 10.1117/12.633668
Authors: Hironori Sasaki, Shuichi Sanki, Ryugo Hikichi, Kiyoshi Ogawa, Akihiko Naito, Yukihiro Sato, Yasuyuki Kushida, Naoyuki Ishiwata, Hiroshi Maruyama
Institutions: Dai Nippon Printing (Japan), Fujitsu (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2012562970