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Akihiko Naito
Observed name:
A. Naito
Institution:
Dai Nippon Printing (Japan)
Observed institution:
Dai Nippon Printing (Japan)
OpenAlex ID:
A5053403231
A new model of haze generation and storage-life-time estimation for mask
2006
·
S. Shimada
, N. Kanda
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Root cause analysis for crystal growth at ArF excimer laser lithography
2004
·
Hiroyuki Ishii
, Atsushi Tobita
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Process monitoring of chrome dry-etching with RF sensor for reticle production beyond 90-nm node
2003
·
Hitoshi Handa
, Satoshi Yamauchi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Mechanism of megasonic damages for micropatterns
2006
·
Y. Suwa
, S. Shimada
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Advanced process control of mask dry-etching using RF sensor
2006
·
Hitoshi Handa
, Satoshi Yamauchi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Noble development system to achieve defect-free process for 65-nm node photomasks
2005
·
Hironori Sasaki
, Shuichi Sanki
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
6
Citation count:
31
H-index:
4
I10-index:
2
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