Work

Talbot lithography as an alternative for contact lithography for submicron features

Year: 2014

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2036896

Authors: L. A. Dunbar, D. Nguyen, B. Timotijevic, U. Vogler, S. Veseli, G. Bergonzi, S. Angeloni, A. Bramati, R. Voelkel, R. P. Stanley

Institutions: Swiss Center for Electronics and Microtechnology (Switzerland), Suss Microoptics (Switzerland)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Kommission für Technologie und Innovation

OpenAlex ID: W2013138940

FWCI: 2.409

Cites: 11

Cited by: 13

Related to: 10