Author

Arianna Bramati

Observed names: A. Bramati, Bramati, A., Bramati, Arianna

Institution: Suss Microoptics (Switzerland)

Observed institutions: Suss Microoptics (Switzerland), École Polytechnique Fédérale de Lausanne

OpenAlex ID: A5058108406

Advanced mask aligner lithography (AMALITH)

2012 · Reinhard Voelkel, Uwe Vogler, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18

Talbot lithography as an alternative for contact lithography for submicron features

2014 · L. A. Dunbar, D. Nguyen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

Mask aligner lithography simulation – From lithography simulation to process validation

2012 · K. Motzek, S. Partel, et al. · Microelectronic Engineering · 13

Advanced mask aligner lithography (AMALITH) for thick photoresist

2013 · Reinhard Voelkel, Uwe Vogler, et al. · Microsystem Technologies · 8

Advanced Mask Aligner Lithography (AMALITH)

2015 · Reinhard Voelkel, Uwe Vogler, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Shaping intensity behind amplitude masks for proximity correction lithography: design, measurement, and realization

2014 · Krishnaparvathy Puthankovilakam, Toralf Scharf, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Simulation tools for advanced mask aligner lithography

2011 · Arianna Bramati, Uwe Vogler, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Micro-optics and lithography simulation are key enabling technologies for shadow printing lithography in mask aligners

2015 · Reinhard Voelkel, Uwe Vogler, et al. · Advanced Optical Technologies · 5

Lithographic process window optimization for mask aligner proximity lithography

2014 · Reinhard Voelkel, Uwe Vogler, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Advanced mask aligner lithography (AMALITH)

2013 · L. A. Dunbar, G. Bergonzi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Phase analysis of amplitude binary mask structures

2016 · Krishnaparvathy Puthankovilakam, Toralf Scharf, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Coherence management in lithography printing systems

2016 · Johana Bernasconi, Toralf Scharf, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Lightfields behind amplitude masks: Creating phase discontinuities

2016 · Toralf Scharf, Krishnaparvathy Puthankovilakam, et al. · Workshop on Information Optics

Lightfields behind amplitude and phase masks applications in high resolution proximity lithography

2015 · Toralf Scharf, Krishnaparvathy Puthankovilakam, et al. · Workshop on Information Optics

Works count: 17

Citation count: 83

H-index: 6

I10-index: 3