Work

Mask aligner lithography simulation – From lithography simulation to process validation

Year: 2012

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/j.mee.2012.07.076

Authors: K. Motzek, S. Partel, A. Bramati, U. Hofmann, N. Ünal, M. Hennemeyer, M. Hornung, A. Heindl, M. Ruhland, A. Erdmann, P. Hudek

Institutions: Fraunhofer Institute for Integrated Systems and Device Technology, Vorarlberg University of Applied Sciences, Suss Microoptics (Switzerland), GenISys (Germany), SUSS MicroTec (Germany), Osram Opto Semiconductors

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Bayerische Forschungsstiftung

OpenAlex ID: W2089697702

FWCI: 1

Cites: 10

Cited by: 13

Related to: 10