Work

Advanced Mask Aligner Lithography (AMALITH)

Year: 2015

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2085792

Authors: Reinhard Voelkel, Uwe Vogler, Arianna Bramati

Institution: Suss Microoptics (Switzerland)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2014564366

FWCI:

Cites: 22

Cited by: 6

Related to: 10