Work

Actinic review of EUV masks: first results from the AIMS EUV system integration

Year: 2014

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2046302

Authors: Markus R. Weiss, Dirk Hellweg, Jan Hendrik Peters, Sascha Perlitz, Anthony Garetto, Michael Goldstein

Institution: Carl Zeiss (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2013238973

FWCI: 4.817

Cites: 6

Cited by: 15

Related to: 10