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Jan Hendrik Peters

Observed names: J. H. Peters, Jan H. Peters, Jan Hendrick Peters, Peters Jan Hendrik
ORCID: 0009-0006-9433-9698
Observed ORCID: 0009-0006-9433-9698
OpenAlex ID: A5109869205
Massively parallel E-beam inspection: enabling next-generation patterned defect inspection for wafer and mask manufacturing
2015 · Matt Malloy, Brad Thiel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 23
Aerial imaging technology for photomask qualification: from a microscope to a metrology tool
2012 · Anthony Garetto, Thomas Scherübl, et al. · Advanced Optical Technologies · 19
Actinic review of EUV masks: first results from the AIMS EUV system integration
2014 · Markus R. Weiss, Dirk Hellweg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Determination of mask-induced polarization effects occurring in hyper NA immersion lithography
2005 · Silvio Teuber, Karsten Bubke, et al. · Optical Microlithography XVIII · 13
Defect mitigation considerations for EUV photomasks
2014 · Anthony D. Garetto, Renzo Capelli, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 12
Mask characterization for double patterning lithography
2009 · Karsten Bubke, Robert de Kruif, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 11
Wafer based mask characterization for double patterning lithography
2008 · Robert de Kruif, Karsten Bubke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Actinic review of EUV masks: Status and recent results of the AIMS EUV system
2015 · Markus R. Weiss, Dirk Hellweg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Closing the infrastructure gap: status of the AIMS EUV project
2012 · Dirk Hellweg, Markus Weiss, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
An investigation of EUV lithography defectivity
2008 · Kevin D. Cummings, Thomas Laursen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Enabling future generation high-speed inspection through a massively parallel e-beam approach
2015 · Matt Malloy, Benjamin Bunday, et al. · ASMC proceedings · 4
AIMS EUV first light imaging performance
2014 · Anthony Garetto, Renzo Capelli, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Status of the AIMS EUV development project
2013 · Anthony Garetto, Jan Hendrik Peters, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography
2011 · Lieve Van Look, Joost P. Bekaert, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 4
Assessing EUV mask defectivity
2010 · Uzodinma Okoroanyanwu, Anna Tchikoulaeva, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Development status and infrastructure progress update of aerial imaging measurements on EUV masks
2011 · Sascha Perlitz, Wolfgang Harnisch, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Mask performance improvement with mapping
2009 · Clemens Utzny, Eric Cotte, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
EUV blank inspection
2008 · J. H. Peters, C. Tonk, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
The first full-field EUV masks ready for printing
2006 · Uwe Mickan, Rogier Groeneveld, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Status of EUVL mask development in Europe (Invited Paper)
2005 · Jan H. Peters · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Mask characterization for double patterning lithography
2007 · Karsten Bubke, Eric Cotte, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Manufacturing of the first EUV full-field scanner mask
2006 · Uwe Dersch, Rico Buettner, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Actinic review of EUV masks: status and recent results of the AIMSTMEUV System
2015 · Sascha Perlitz, Jan Hendrik Peters, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Wafer inspection as alternative approach to mask defect qualification
2007 · Christian Holfeld, Frank Katzwinkel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Enabling inspection solutions for future mask technologies through the development of massively parallel E-Beam inspection
2015 · Matt Malloy, Brad Thiel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 32
Citation count: 171
H-index: 9
I10-index: 7
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