Work

Mask characterization for double patterning lithography

Year: 2007

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.747006

Authors: Karsten Bubke, Eric Cotte, Jan Hendrik Peters, Robert de Kruif, Mircea Dusa, Joerg Fochler, Brid Connolly

Institutions: Advanced Mask Technology Center (Germany), ASML (Netherlands), ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Bundesministerium für Bildung und Forschung

OpenAlex ID: W2008657119

FWCI: 1.004

Cites: 11

Cited by: 2

Related to: 10