Work

Quantitative Analysis of Surface Contaminations on Si Wafers by Total Reflection X-Ray Fluorescence

Year: 1992

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.31.l11

Authors: Hideyuki Kondo, Jiro Ryuta, Etsuro Morita, Toshihiro Yoshimi, Yasushi Shimanuki Yasushi Shimanuki

Institution: Mitsubishi Materials (Japan)

Language: English

Topic: X-ray Spectroscopy and Fluorescence Analysis

Subfield: Radiation

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2013259163

FWCI: 5.853

Cites: 3

Cited by: 23

Related to: 10