Lithography of choice for the 45-nm node: new medium, new wavelength, or new beam?
Year: 2004
Type: conference-paper
DOI: 10.1117/12.535104
Authors: Fumikatsu Uesawa, Mikio Katsumata, Kazuhisa Ogawa, Koichi Takeuchi, Shinji Omori, Masaki Yoshizawa, Hiroichi Kawahira
Institution: Sony (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2013786980