Work

Color-Sensitive Si-Photodiode Using Porous Silicon Interference Filters

Year: 1997

Type: article

Abstract: A new method for the fabrication of color-sensitive Si-photodiodes is presented. Color sensitivity was achieved by using porous silicon multilayer stacks which act as interference filters if the formation parameters are controlled carefully. These filters were integrated in the upper, p+-type part of a p+n-junction. As expected, the spectral response of the photodiodes was determined by the transmission spectra of the filters, while the porous silicon had no significant influence on the electrical characteristics. The great advantage of this method over conventional ones is that it makes very cheap, fast filter fabrication requiring no expensive deposition process possible.

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.36.l24

Authors: Michael Krüger, Michael Goetz Berger, Michel Marso, Winfried Reetz, Thomas Eickhoff, Roger Loo, Lili Vescan, Markus Thönissen, Hans Lüth, Rüdiger Arens-Fischer, Stefan Hilbrich, Wolfgang Theiss

Institutions: Forschungszentrum Jülich, RWTH Aachen University

Language: English

Topic: Silicon Nanostructures and Photoluminescence

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W2015159646

FWCI: 1.585

Cites: 8

Cited by: 17

Related to: 10