Work

200-mm-diameter neutral beam source based on inductively coupled plasma etcher and silicon etching

Year: 2010

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.3474977

Authors: Tomohiro Kubota, Osamu Nukaga, Shinji Ueki, Masakazu Sugiyama, Yoshimasa Inamoto, Hiroto Ohtake, Seiji Samukawa

Institutions: Institute of Industrial Science, The University of Tokyo, The University of Tokyo, Panasonic (Japan), Tohoku University, Institute of Fluid Science, Tohoku University

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2017104124

FWCI: 1.225

Cites: 28

Cited by: 14

Related to: 10