Work

LPCVD RexSiyNz diffusion barriers in Si/SiO2/Cu metallizations

Year: 1995

Type: article

Source: Applied Surface Science

DOI: 10.1016/0169-4332(95)00131-x

Authors: A.-M. Dutron, E. Blanquet, C. Bernard, A. Bachli, R. Madar

Institutions: California Institute of Technology, Laboratoire des Matériaux et du Génie Physique

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2017112912

FWCI:

Cites: 29

Cited by: 3

Related to: 10