Work

Developing a High Volume Manufacturing Wet Clean Process to Remove BF2 Implant Induced Molybdenum Contamination

Year: 2009

Type: article

Source: Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

DOI: 10.4028/www.scientific.net/ssp.145-146.127

Authors: Akshey Sehgal, Hsin Hsiung Huang, Jamal Ramdani, Jeffrey Klatt, Craig Printy, Scott Ruby, Todd Thibeault

Institution: Montana Technological University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2017508955

FWCI: 0.258

Cites:

Cited by: 1

Related to: 10