Work

Diffusion of phosphorus implanted in germanium

Year: 2008

Type: article

Source: Materials Science and Engineering B

DOI: 10.1016/j.mseb.2008.08.004

Authors: Th. Canneaux, D. Mathiot, J.P. Ponpon, S. Roques, S. Schmitt, Ch. Dubois

Institutions: Centre National de la Recherche Scientifique, Institut des Nanotechnologies de Lyon, Institut National des Sciences Appliquées de Lyon

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2017563284

FWCI: 0.373

Cites: 15

Cited by: 12

Related to: 10