Work

Polyimide as a negative electron resist and its application in crossovers and metal on polymer mask fabrication

Year: 1986

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

DOI: 10.1116/1.583340

Authors: W. Patrick, W. S. Mackie, S. P. Beaumont, C. D. W. Wilkinson

Institution: University of Glasgow

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2017830002

FWCI:

Cites:

Cited by: 4

Related to: 10